
Proceedings Paper
Ellipsometric studies of the absorption of liquid by photo resistFormat | Member Price | Non-Member Price |
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Paper Abstract
In situ spectroscopic ellipsometry, deep UV ellipsometry, and imaging ellipsometry were employed to study the
absorption of liquid by photoresist(PR) used for 193 nm immersion lithography. When 140 nm thick PR was soaked in
water over a period of >70 minutes, ~7% increase in thickness was observed. From the analysis of ellipsometric spectra
covering from near infrared to deep UV, we could estimates less than 2 vol. % uptake of water by PR after completion of
soaking. This resulted in very small decrease in refractive index of PR (~0.4%). When imaging ellipsometry was used,
the absorption of water by PR in much shorter periods could be detectible. In imaging ellipsometry, the microscopic
images of (Δ,Ψ ) in small area are obtained thanks to two dimensional multi-channel detection systems such as CCD.
Using imaging ellipsometry, we could observe the interaction of PR with water even upon 1 s of contact. Also, we found
that the water absorption or interaction was not uniform over surface. More studies are required for the implication of
this observation. Obviously, imaging ellipsometry is a good technique to inspect water mark in immersion lithography.
We also repeated similar experiments for high reflective index liquid (JSR HIL-001) but to find negligible change by
imaging ellipsometry.
Paper Details
Date Published: 5 April 2007
PDF: 7 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651849 (5 April 2007); doi: 10.1117/12.710811
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
PDF: 7 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651849 (5 April 2007); doi: 10.1117/12.710811
Show Author Affiliations
Hee Jeong, Hanyang Univ. (South Korea)
Jaesun Kyung, Hanyang Univ. (South Korea)
Songyi Park, Hanyang Univ. (South Korea)
Kiyong Lee, Hanyang Univ. (South Korea)
Jaesun Kyung, Hanyang Univ. (South Korea)
Songyi Park, Hanyang Univ. (South Korea)
Kiyong Lee, Hanyang Univ. (South Korea)
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
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