
Proceedings Paper
Monitoring airborne molecular contamination: a quantitative and qualitative comparison of real-time and grab-sampling techniquesFormat | Member Price | Non-Member Price |
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Paper Abstract
Monitoring and controlling Airborne Molecular Contamination (AMC) has become essential in deep ultraviolet (DUV)
photolithography for both optimizing yields and protecting tool optics. A variety of technologies have been employed
for both real-time and grab-sample monitoring. Real-time monitoring has the advantage of quickly identifying "spikes"
and upset conditions, while 2 - 24 hour plus grab sampling allows for extremely low detection limits by concentrating
the mass of the target contaminant over a period of time. Employing a combination of both monitoring techniques
affords the highest degree of control, lowest detection limits, and the most detailed data possible in terms of speciation.
As happens with many technologies, there can be concern regarding the accuracy and agreement between real-time and
grab-sample methods. This study utilizes side by side comparisons of two different real-time monitors operating in
parallel with both liquid impingers and dry sorbent tubes to measure NIST traceable gas standards as well as real world
samples. By measuring in parallel, a truly valid comparison is made between methods while verifying the results against
a certified standard. The final outcome for this investigation is that a dry sorbent tube grab-sample technique produced
results that agreed in terms of accuracy with NIST traceable standards as well as the two real-time techniques Ion
Mobility Spectrometry (IMS) and Pulsed Fluorescence Detection (PFD) while a traditional liquid impinger technique
showed discrepancies.
Paper Details
Date Published: 5 April 2007
PDF: 13 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183Z (5 April 2007); doi: 10.1117/12.707776
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
PDF: 13 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183Z (5 April 2007); doi: 10.1117/12.707776
Show Author Affiliations
Aaron M. Shupp, Particle Measuring Systems, Inc. (United States)
Dan Rodier, Particle Measuring Systems, Inc. (United States)
Dan Rodier, Particle Measuring Systems, Inc. (United States)
Steven Rowley, Particle Measuring Systems, Inc. (United States)
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
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