Share Email Print

Proceedings Paper

Monitoring airborne molecular contamination: a quantitative and qualitative comparison of real-time and grab-sampling techniques
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Monitoring and controlling Airborne Molecular Contamination (AMC) has become essential in deep ultraviolet (DUV) photolithography for both optimizing yields and protecting tool optics. A variety of technologies have been employed for both real-time and grab-sample monitoring. Real-time monitoring has the advantage of quickly identifying "spikes" and upset conditions, while 2 - 24 hour plus grab sampling allows for extremely low detection limits by concentrating the mass of the target contaminant over a period of time. Employing a combination of both monitoring techniques affords the highest degree of control, lowest detection limits, and the most detailed data possible in terms of speciation. As happens with many technologies, there can be concern regarding the accuracy and agreement between real-time and grab-sample methods. This study utilizes side by side comparisons of two different real-time monitors operating in parallel with both liquid impingers and dry sorbent tubes to measure NIST traceable gas standards as well as real world samples. By measuring in parallel, a truly valid comparison is made between methods while verifying the results against a certified standard. The final outcome for this investigation is that a dry sorbent tube grab-sample technique produced results that agreed in terms of accuracy with NIST traceable standards as well as the two real-time techniques Ion Mobility Spectrometry (IMS) and Pulsed Fluorescence Detection (PFD) while a traditional liquid impinger technique showed discrepancies.

Paper Details

Date Published: 5 April 2007
PDF: 13 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65183Z (5 April 2007); doi: 10.1117/12.707776
Show Author Affiliations
Aaron M. Shupp, Particle Measuring Systems, Inc. (United States)
Dan Rodier, Particle Measuring Systems, Inc. (United States)
Steven Rowley, Particle Measuring Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?