Share Email Print
cover

Proceedings Paper

Microfocus EUV tube for at-wavelength reflectometry
Author(s): André Egbert; Stefan Becker
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Reliable and compact extreme ultraviolet (EUV) laboratory sources are strongly required for in-house characterization of optical components and for the precise calibration of EUV diagnostic instruments. The EUV tube, based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range around 13.5 nm, is an important tool for these applications. Great benefits of this source are a compact and flexible design, debris-free operation, and high temporal and spatial long-term stability. Detailed characteristics of the source performance are reported and different examples for at-wavelength metrology are presented.

Paper Details

Date Published: 21 March 2007
PDF: 6 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651739 (21 March 2007); doi: 10.1117/12.706126
Show Author Affiliations
André Egbert, phoenix|euv Systems + Services GmbH (Germany)
Stefan Becker, phoenix|euv Systems + Services GmbH (Germany)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray