Proceedings Paper
High-peak-power pulse amplification using Yb-doped double-clad fiber| Format | Member Price | Non-Member Price |
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Paper Abstract
A high peak-power, high repetition rate Master Oscillator Power Amplifier (MOPA) system incorporating an
Yb-doped fiber amplifier and its second harmonic generation were investigated in detail. The oscillator is actively
Q-switch microchip laser at repetition rate of 50 kHz with a pulse width of 2.8ns. The amplifier employing Yb-doped
polarization maintaining fiber, having a large mode area was exited by a laser diode with an optical power of 17W. As
results, the amplified average output power of 10W and the optical conversion efficiency of 59% were achieved. In
this MOPA system, second harmonic generation (SHG) experiments were performed using KTP and LBO crystals. The
conversion efficiency of 21% and 40%, the maximum SHG power of 0.92 W and 3.3W were obtained for KTP crystal and LBO crystal respectively.
Paper Details
Date Published: 21 February 2007
PDF: 9 pages
Proc. SPIE 6453, Fiber Lasers IV: Technology, Systems, and Applications, 645325 (21 February 2007); doi: 10.1117/12.702639
Published in SPIE Proceedings Vol. 6453:
Fiber Lasers IV: Technology, Systems, and Applications
Donald J. Harter; Andreas Tünnermann; Jes Broeng; Clifford Headley III, Editor(s)
PDF: 9 pages
Proc. SPIE 6453, Fiber Lasers IV: Technology, Systems, and Applications, 645325 (21 February 2007); doi: 10.1117/12.702639
Show Author Affiliations
Ryusuke Horiuchi, Tokai Univ. (Japan)
Hiroaki Sunaga, Tokai Univ. (Japan)
Kazuyoku Tei, Tokai Univ. (Japan)
Institute for Applied Optics (Japan)
Hiroaki Sunaga, Tokai Univ. (Japan)
Kazuyoku Tei, Tokai Univ. (Japan)
Institute for Applied Optics (Japan)
Shigeru Yamaguchi, Tokai Univ. (Japan)
Kenzo Nanri, Tokai Univ. (Japan)
Tomoo Fujioka, Tokai Univ. (Japan)
Institute for Applied Optics (Japan)
Kenzo Nanri, Tokai Univ. (Japan)
Tomoo Fujioka, Tokai Univ. (Japan)
Institute for Applied Optics (Japan)
Published in SPIE Proceedings Vol. 6453:
Fiber Lasers IV: Technology, Systems, and Applications
Donald J. Harter; Andreas Tünnermann; Jes Broeng; Clifford Headley III, Editor(s)
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