
Proceedings Paper
UV-laser ablation of fused silica mediated by solid coating absorptionFormat | Member Price | Non-Member Price |
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Paper Abstract
Micro patterning of fused silica by laser ablation is very challenging due to the lack of absorption in the whole spectral
range from the deep UV to the near IR. Beside vacuum UV lasers emitting at 157 nm or femtosecond lasers inducing
multi photon absorption, indirect methods utilizing external absorbers are applied. Established methods like LIBWE and
LIPAA are applicable in a backside configuration, i.e. the laser beam has to pass the workpiece before inducing ablation
at the backside. This causes restrictions concerning the shape of the workpiece, i.e. generally a flat front surface is
necessary. We propose an indirect ablation method that can be applied for both, back side and front side processing. The
fused silica substrate to be machined is coated with a UV-absorbing oxide film. This film is irradiated using an excimer
laser leading to ablation of the film and, at sufficiently high fluence, to surface ablation of the fused silica substrate. The
ablation depth in the silica can be controlled by the fluence in excess to the threshold. The remaining coating in the
unexposed areas is removed afterwards by large area irradiation of the whole surface at a fluence above the threshold of
film ablation, but below the threshold of substrate ablation.
Paper Details
Date Published: 13 March 2007
PDF: 7 pages
Proc. SPIE 6458, Photon Processing in Microelectronics and Photonics VI, 64580E (13 March 2007); doi: 10.1117/12.701140
Published in SPIE Proceedings Vol. 6458:
Photon Processing in Microelectronics and Photonics VI
David B. Geohegan; Craig B. Arnold; Tatsuo Okada; Frank Träger; Jan J. Dubowski; Michel Meunier; Andrew S. Holmes, Editor(s)
PDF: 7 pages
Proc. SPIE 6458, Photon Processing in Microelectronics and Photonics VI, 64580E (13 March 2007); doi: 10.1117/12.701140
Show Author Affiliations
J. Ihlemann, Laser-Lab. Göttingen e.V. (Germany)
Published in SPIE Proceedings Vol. 6458:
Photon Processing in Microelectronics and Photonics VI
David B. Geohegan; Craig B. Arnold; Tatsuo Okada; Frank Träger; Jan J. Dubowski; Michel Meunier; Andrew S. Holmes, Editor(s)
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