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Proceedings Paper

Industrial micromachining with advanced solid state lasers
Author(s): J. Stollhof; S. Weiler; Chuong Tan; Ivo Zawischa; D. H. Sutter; J. Kleinbauer; M. Kumkar
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Paper Abstract

TRUMPF Laser has developed an advanced solid-state q-switched laser, designed specifically to meet the requirements of industrial micro-processing. Pulse energies exceeding 4 mJ, pulse durations adapted to the application and a diffraction limited beam (M2 < 1.2) are essential for micro-machining. A novel feature of the laser ensures its particularly high performance and overall stability. The technical concept is based on a power oscillator, where the output power is not set by adjusting the pump power, but rather by precise switching and attenuation of the pulses outside of the resonator. This leads to a high stability and a fixed concentric beam profile, independent of the actual output power of the system. In the field of micro-processing, laser light is primarily used for the precise ablation of various materials. High intensities beyond 1011 W/cm2 enable the development of new laser processing strategies, e.g. sublimation-cutting and -drilling. High stability in terms of beam quality, beam location (pointing stability < 10 &mgr;rad) and pulse energy allows for both the improvement of well known laser processes as well as pushing forward new applications. Additionally, the repetition rate of up to several hundred kilohertz and the high average power emphasizes the high performance of the developed system, particularly with regard to the competition with alternative manufacturing strategies. Further potential to increase the precision and to minimize the heat affected zone (HAZ) is given by the application of ultrashort picosecond and femtosecond pulses. TRUMPF Laser has already demonstrated a CPA-free, diode-pumped all-solid-state laser, delivering picosecond pulses with an average power of 50 W.

Paper Details

Date Published: 20 February 2007
PDF: 8 pages
Proc. SPIE 6451, Solid State Lasers XVI: Technology and Devices, 64511J (20 February 2007); doi: 10.1117/12.700469
Show Author Affiliations
J. Stollhof, Trumpf Laser GmbH & Co. KG (Germany)
S. Weiler, Trumpf Laser GmbH & Co. KG (Germany)
Chuong Tan, Trumpf Laser GmbH & Co. KG (Germany)
Ivo Zawischa, Trumpf Laser GmbH & Co. KG (Germany)
D. H. Sutter, Trumpf Laser GmbH & Co. KG (Germany)
J. Kleinbauer, Trumpf Laser GmbH & Co. KG (Germany)
M. Kumkar, Trumpf Laser GmbH & Co. KG (Germany)

Published in SPIE Proceedings Vol. 6451:
Solid State Lasers XVI: Technology and Devices
Hanna J. Hoffman; Ramesh K. Shori; Norman Hodgson, Editor(s)

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