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Proceedings Paper

Characterization of absorption losses in deep UV optical materials
Author(s): K. Mann; U. Leinhos; B. Schäfer
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Paper Abstract

Comprehensive calorimetric absorption measurements were performed for CaF2 crystals at irradiation wavelengths 193 nm and 157 nm. By using samples with different thickness a separation of surface and bulk absorptance could be achieved and thus, single- and two-photon absorption coefficients could be determined. For the surface absorptance, a dependence of the polishing grade of the sample was observed at 193 nm. The presented results support earlier proposed models of the absorption mechanisms in wide band-gap materials. For an assessment of the optical quality of DUV optics, a high-sensitivity wavefront analyzer system based on the Hartmann-Shack principle is employed. The device accomplishes precise online monitoring of wavefront deformations of a collimated test beam transmitted through the laser-irradiated site of a sample. Due to the achieved sub-nm resolution, it can be used as an alternative to interferometric measurements for 'at wavelength' testing of optics, e.g. for on-line registration of thermal lensing effects or compaction in fused silica.

Paper Details

Date Published: 15 January 2007
PDF: 10 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64031J (15 January 2007); doi: 10.1117/12.696123
Show Author Affiliations
K. Mann, Laser-Lab. Göttingen e.V. (Germany)
U. Leinhos, Laser-Lab. Göttingen e.V. (Germany)
B. Schäfer, Laser-Lab. Göttingen e.V. (Germany)

Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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