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Proceedings Paper

Mask defect imaging system using backscattered electron images
Author(s): Katsuyuki Takahashi; Masashi Ataka; Takao Namae
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Paper Abstract

The optical inspection system has been applied for mask inspection. The small but fatal detects on the mask can not be detected minutely by the optical system because of the limitations of optical resolution. We have developed the Defect Imaging System (DIS-05) using Backscattered Electron Images (BSI). DIS-05 is composed of 3 units: (1) SEM with a newly developed Backscattered Electron detector, (2) CAD computer to create CAD Image and, (3) Main computer to control the SEM and CAD computer. One of key technologies for DIS-05 is the technique of detecting BSI at a high contrast. Moreover, we herewith describe "Superimposed Image", which compares BSI with CAD one. Finally, we also report the possibility of detecting "haze on masks" using DIS-05.

Paper Details

Date Published: 20 October 2006
PDF: 10 pages
Proc. SPIE 6349, Photomask Technology 2006, 63493P (20 October 2006); doi: 10.1117/12.694530
Show Author Affiliations
Katsuyuki Takahashi, Holon Co., Ltd. (Japan)
Masashi Ataka, Holon Co., Ltd. (Japan)
Takao Namae, Holon Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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