
Proceedings Paper
Broadband source with high power supported by the combined effects of EDFA, Raman scattering, and parametric processFormat | Member Price | Non-Member Price |
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Paper Abstract
A broadband source (1520-1620nm) with output power of more than 200mW is achieved using only a single-wavelength pumping scheme dependent on the combined effects of stimulated Raman scattering, parametric process, and Erbium-doped fiber amplification.
Paper Details
Date Published: 10 June 2006
PDF: 5 pages
Proc. SPIE 6344, Advanced Laser Technologies 2005, 634412 (10 June 2006); doi: 10.1117/12.693522
Published in SPIE Proceedings Vol. 6344:
Advanced Laser Technologies 2005
Ivan A. Shcherbakov; Kexin Xu; Qingyue Wang; Alexander V. Priezzhev; Vladimir I. Pustovoy, Editor(s)
PDF: 5 pages
Proc. SPIE 6344, Advanced Laser Technologies 2005, 634412 (10 June 2006); doi: 10.1117/12.693522
Show Author Affiliations
Fuyun Lu, Nankai Univ. (China)
Zhaohui Li, Institute for Infocomm Research (Singapore)
Yu Fan, Nankai Univ. (China)
Zhaohui Li, Institute for Infocomm Research (Singapore)
Yu Fan, Nankai Univ. (China)
Xiao Hann Lim, Institute for Infocomm Research (Singapore)
Jian Chen, Institute for Infocomm Research (Singapore)
Chao Lu, Institute for Infocomm Research (Singapore)
Jian Chen, Institute for Infocomm Research (Singapore)
Chao Lu, Institute for Infocomm Research (Singapore)
Published in SPIE Proceedings Vol. 6344:
Advanced Laser Technologies 2005
Ivan A. Shcherbakov; Kexin Xu; Qingyue Wang; Alexander V. Priezzhev; Vladimir I. Pustovoy, Editor(s)
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