Share Email Print

Proceedings Paper

Vacuum technological equipment for microphotoelectronic production
Author(s): A. N. Kozlov; I. S. Gaidoukova; A. G. Uvaev; A. B. Scherbakov; A. M. Filachev
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The paper presents a series of electron-beam and ion-plasma installations for microphotoelectronic industry. The vacuum film deposition installation allows conducting unbreakable process of ion-beam etching, magnetron sputtering, and resistance-heated evaporation aimed to make a multi-component contact with the p-type semiconductor regions. Using the low-energy ions for substrate cleaning and etching reduces radiation damage of the substrate material and helps to avoid p-region inversion. The ion-beam etching installation is designed to etch semiconductor and metal materials in either inert or reactive gas environment to produce silicon MOS multiplexors. The electron-beam welding installation is designed for sealing the evacuated cases of photodiode array detectors.

Paper Details

Date Published: 31 May 2006
PDF: 5 pages
Proc. SPIE 6278, Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics, 62780A (31 May 2006);
Show Author Affiliations
A. N. Kozlov, RD&P Ctr. ORION (Russia)
I. S. Gaidoukova, RD&P Ctr. ORION (Russia)
A. G. Uvaev, RD&P Ctr. ORION (Russia)
A. B. Scherbakov, RD&P Ctr. ORION (Russia)
A. M. Filachev, RD&P Ctr. ORION (Russia)

Published in SPIE Proceedings Vol. 6278:
Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics
Anatoly M. Filachev, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?