Proceedings Paper
Design for manufacturing validation tool: fast and reliable conversion of SEM images to GDS images| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
The ability to convert high resolution images from a Scanning Electron Microscope (SEM) of a printed
lithographic pattern to a GDS image file which can be input into modeling software (such as litho-simulation,
etc.) for rigorous analysis is a powerful tool. Its use can be expanded through the simplication of the SEM2GDS
conversion procedure by automation of the tasks. In this paper, we describe our SEM2GDS and SCAN
INTERFACE UNIT, which automates both SEM image collection and SEM2GDS conversion.
Paper Details
Date Published: 21 June 2006
PDF: 8 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810Y (21 June 2006); doi: 10.1117/12.692747
Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)
PDF: 8 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810Y (21 June 2006); doi: 10.1117/12.692747
Show Author Affiliations
D. Ronning, Lite Enterprises (United States)
D. Ducharme, Lite Enterprises (United States)
R. Selzer, JMAR Systems (United States)
B. Boerger, JMAR Systems (United States)
D. Ducharme, Lite Enterprises (United States)
R. Selzer, JMAR Systems (United States)
B. Boerger, JMAR Systems (United States)
M. Yu, JMAR Systems (United States)
B. Xing, JMAR Systems (United States)
M. Trybendis, MJT Consulting (United States)
B. Grenon, Grenon Consulting (United States)
B. Xing, JMAR Systems (United States)
M. Trybendis, MJT Consulting (United States)
B. Grenon, Grenon Consulting (United States)
Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)
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