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Proceedings Paper

Consequences of plasmonic effects in photomasks
Author(s): F. M. Schellenberg; K. Adam; J. Matteo; L. Hesselink
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Paper Abstract

For 45nm lithography and beyond, polarization and other electromagnetic effects such as surface plasmons may begin to affect the transmission through a photomask. Such phenomena are highly polarization sensitive, and may amplify the effects of line-edge roughness (LER) and variations in mask composition. A reduction in the mask material conductivity can mitigate the impact of these effects, but more accurate simulation is required to predict these effects well.

Paper Details

Date Published: 21 June 2006
PDF: 10 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810B (21 June 2006); doi: 10.1117/12.692732
Show Author Affiliations
F. M. Schellenberg, Mentor Graphics (United States)
K. Adam, Mentor Graphics (United States)
J. Matteo, Stanford Univ. (United States)
L. Hesselink, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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