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Proceedings Paper

Extreme ring fields in microlithography
Author(s): Alexander Epple
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Paper Abstract

A design study leading to a new inline catadioptric design type is presented. The design is especially dedicated to be used with extreme ring field geometries not known in lithography optics so far. This may allow to increase the numerical aperture to the physical limits both in dry and immersion lithography. An exemplary system with high numerical aperture is shown.

Paper Details

Date Published: 18 July 2006
PDF: 9 pages
Proc. SPIE 6342, International Optical Design Conference 2006, 63421R (18 July 2006); doi: 10.1117/12.692313
Show Author Affiliations
Alexander Epple, Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 6342:
International Optical Design Conference 2006
G. Groot Gregory; Joseph M. Howard; R. John Koshel, Editor(s)

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