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Proceedings Paper

Catadioptric projection optical system for flat panel exposure tool
Author(s): Michio Kohno; Kiyoshi Fukami; Hitoshi Yoshioka; Shu Watanabe; Akiyoshi Suzuki
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Paper Abstract

An advanced catadioptric projection optics installed on state-of-the-art flat panel exposure tool is introduced. Both scaling up and aspheric lenses added to the conventional two-mirror optics have enlarged off-axis good imaging field, and contributed to increase the productivity of the machine. This paper discusses the optical characteristics of the advanced optics, and refers to its contribution to the performance of a large flat panel display (FPD) exposure tool. Additionally, not only the fabrication technology of large optical parts in the projection optics but also illumination optical system and mask /plate alignment system in the exposure tool are also disclosed.

Paper Details

Date Published: 12 July 2006
PDF: 9 pages
Proc. SPIE 6342, International Optical Design Conference 2006, 63420Y (12 July 2006); doi: 10.1117/12.692265
Show Author Affiliations
Michio Kohno, Canon Inc. (Japan)
Kiyoshi Fukami, Canon Inc. (Japan)
Hitoshi Yoshioka, Canon Inc. (Japan)
Shu Watanabe, Canon Inc. (Japan)
Akiyoshi Suzuki, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 6342:
International Optical Design Conference 2006
G. Groot Gregory; Joseph M. Howard; R. John Koshel, Editor(s)

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