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Proceedings Paper

Ultra-high-performance microscope objectives: the state of the art in design, manufacturing, and testing
Author(s): Thomas Sure; Lambert Danner; Peter Euteneuer; Gerhard Hoppen; Armin Pausch; Wolfgang Vollrath
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Paper Abstract

During the last years, new microscope applications require an increased resolution which enforces the development of new state of the art high NA immersion objectives. With the introduction of the 4Pi confocal fluorescence microscope, the increase of the numerical aperture from NA=1.4 to NA=1.46 makes sense, although the gain of lateral resolution is quite small. On the other hand, for inspection and metrology in the semiconductor industry the continuously decreasing structures need the highest possible resolution, which can be achieved with high NA water immersion objectives working in the DUV wavelength range. Building this kind of objectives requires special measuring and testing technologies and a manufacturing precision which has never been realized before in series production.

Paper Details

Date Published: 17 July 2006
PDF: 13 pages
Proc. SPIE 6342, International Optical Design Conference 2006, 63420E (17 July 2006); doi: 10.1117/12.692202
Show Author Affiliations
Thomas Sure, Leica Microsystems CMS GmbH (Germany)
Lambert Danner, Vistec Semiconductor Systems GmbH (Germany)
Peter Euteneuer, Leica Microsystems CMS GmbH (Germany)
Gerhard Hoppen, Vistec Semiconductor Systems GmbH (Germany)
Armin Pausch, Leica Microsystems CMS GmbH (Germany)
Wolfgang Vollrath, Vistec Semiconductor Systems GmbH (Germany)

Published in SPIE Proceedings Vol. 6342:
International Optical Design Conference 2006
G. Groot Gregory; Joseph M. Howard; R. John Koshel, Editor(s)

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