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Proceedings Paper

A comparison of wavelet multiresolution analysis and scale-space edge detection for lithography metrology
Author(s): Yoshihiro Midoh; Koji Nakamae; Hiromu Fujioka
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Paper Abstract

We compared performance between the wavelet multiscale edge detection and the scale-space edge detection methods for lithography metrology. First, in order to determine a suitable wavelet, we evaluated the edge detection performance of the wavelet multiscale edge detection method with various types of wavelet families where a modeled SE signal of photoresist with shot noise was used. From the measurement results of average line widths and line edge roughnesses (LERs), the first-order derivative Gaussian wavelet was determined to be the suitable one for the measurement from SE signals of photoresist. Next, the performances were compared. As to the LER measurement, the difference between the two methods was little. However, for average line widths, the wavelet multiscale edge detection method had better performance than the scale-space edge detection method when SNR was lower than 5. Lastly, we applied the two methods to a noisy SEM image of photoresist. The wavelet multiscale edge detection method gave almost the same line width roughness as that of the scale-space edge detection method, though the former took a longer processing time. By setting the wavelet scale space properly, the processing time can be reduced.

Paper Details

Date Published: 12 October 2006
PDF: 9 pages
Proc. SPIE 6383, Wavelet Applications in Industrial Processing IV, 63830H (12 October 2006); doi: 10.1117/12.685872
Show Author Affiliations
Yoshihiro Midoh, Osaka Univ. (Japan)
Koji Nakamae, Osaka Univ. (Japan)
Hiromu Fujioka, Fukui Univ. of Technology (Japan)

Published in SPIE Proceedings Vol. 6383:
Wavelet Applications in Industrial Processing IV
Frédéric Truchetet; Olivier Laligant, Editor(s)

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