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Proceedings Paper

Optical constants in the EUV soft x-ray (5÷152 nm) spectral range of B4C thin films deposited by different deposition techniques
Author(s): G. Monaco; D. Garoli; R. Frison; V. Mattarello; P. Nicolosi; M. G. Pelizzo; V. Rigato; L. Armelao; A. Giglia; S. Nannarone
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Paper Abstract

B4C optical coating represents, together with Ir, Pt, SiC, one of best choice for high reflectance in the extreme ultraviolet region (EUV 160-30 nm). This material is also used in multilayer for soft X-ray applications, such as Si/B4C or W/B4C, or as interlayer in Mo/Si multilayer to avoid interdiffusion also because of its high thermal stability. Our work concerns on B4C thin films deposited on Si [100] substrates by means of three different deposition techniques: RF plasma magnetron sputtering, e-beam evaporation, pulsed laser ablation (PLD). We performed reflectance vs incidence angle measurements from 5 nm to 152 nm on different samples deriving the optical constants with a least-square fitting method. Complete films characterization have been carried out with compositional (XPS), structural (XRD) and morphological (AFM, SEM) analyses.

Paper Details

Date Published: 29 August 2006
PDF: 12 pages
Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631712 (29 August 2006); doi: 10.1117/12.684088
Show Author Affiliations
G. Monaco, CNR-INFM LUXOR Lab., DEI Univ. of Padova (Italy)
D. Garoli, CNR-INFM LUXOR Lab., DEI Univ. of Padova (Italy)
R. Frison, CNR-INFM LUXOR Lab., DEI Univ. of Padova (Italy)
V. Mattarello, Istituto Nazionale di Fisica Nucleare (Italy)
P. Nicolosi, CNR-INFM LUXOR Lab., DEI Univ. of Padova (Italy)
M. G. Pelizzo, CNR-INFM LUXOR Lab., DEI Univ. of Padova (Italy)
V. Rigato, Istituto Nazionale di Fisica Nucleare (Italy)
L. Armelao, Univ. of Padua (Italy)
A. Giglia, ELETTRA/BEAR Synchrotron Trieste (Italy)
S. Nannarone, ELETTRA/BEAR Synchrotron Trieste (Italy)


Published in SPIE Proceedings Vol. 6317:
Advances in X-Ray/EUV Optics, Components, and Applications
Ali M. Khounsary; Christian Morawe, Editor(s)

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