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Proceedings Paper

The surface roughness investigation by the atomic force microscopy, x-ray scattering, and light scattering
Author(s): M. L. Zanaveskin; Yu. V. Grishchenko; A. L. Tolstikhina; V. E. Asadchikov; B. S. Roshchin; V. V. Azarova
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Paper Abstract

Roughness investigation of the polished quartz and sital substrates, used as substrates for multilayer interference mirrors in circle laser gyroscopes, were carried out. Atomic force microscopy, x-ray scattering and angle-resolved scattering instruments were used. The power spectral density function and effective rms roughness were calculated. Good correlation of power spectral density functions and effective rms roughness was shown for all instruments. Essentially difference of the polishing quality was shown for sital substrates manufactured by two different producers.

Paper Details

Date Published: 10 June 2006
PDF: 9 pages
Proc. SPIE 6260, Micro- and Nanoelectronics 2005, 62601A (10 June 2006); doi: 10.1117/12.683482
Show Author Affiliations
M. L. Zanaveskin, Institute of Crystallography (Russia)
Yu. V. Grishchenko, Institute of Crystallography (Russia)
A. L. Tolstikhina, Institute of Crystallography (Russia)
V. E. Asadchikov, Institute of Crystallography (Russia)
B. S. Roshchin, Institute of Crystallography (Russia)
V. V. Azarova, Polyus Research and Development Institute (Russia)

Published in SPIE Proceedings Vol. 6260:
Micro- and Nanoelectronics 2005
Kamil A. Valiev; Alexander A. Orlikovsky, Editor(s)

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