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Proceedings Paper

First look at across-chip performance and process noise using non-contact performance-based metrology
Author(s): Majid Babazadeh; Bertrand Borot; Wim Doedel; José Estabil; Jean Galvier; Gloria Johnson; Nader Pakdaman; Gary Steinbrueck; James Vickers
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Paper Abstract

We report on the first non-contact, non-destructive performance measurements of embedded Ring Oscillators. Measurements are made on inside the die active area as early as Metal 1. A 90nm logic CMOS technology was used for this work. We have measured residual across-field performance process noise, and variation separate from and of opposite sense to wafer uniformity. This effect cannot be extrapolated from scribe measurements.

Paper Details

Date Published: 15 March 2006
PDF: 8 pages
Proc. SPIE 6155, Data Analysis and Modeling for Process Control III, 615502 (15 March 2006); doi: 10.1117/12.683362
Show Author Affiliations
Majid Babazadeh, tau-Metrix, Inc. (United States)
Bertrand Borot, Crolles II Alliance (France)
Wim Doedel, Crolles II Alliance (France)
José Estabil, tau-Metrix, Inc. (United States)
Jean Galvier, Crolles II Alliance (France)
Gloria Johnson, Tau-Metrix, Inc. (United States)
Nader Pakdaman, Tau-Metrix, Inc. (United States)
Gary Steinbrueck, Tau-Metrix, Inc. (United States)
James Vickers, Tau-Metrix, Inc. (United States)

Published in SPIE Proceedings Vol. 6155:
Data Analysis and Modeling for Process Control III
Iraj Emami; Kenneth W. Tobin Jr., Editor(s)

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