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Proceedings Paper

Residual layer-free detachment-based nanolithography
Author(s): Jae Kwan Kim; Jee Won Park; Hongjoo Yang; Mansoo Choi; Joon Ho Choi; Kahp Yang Suh
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Paper Abstract

We present a simple method to generate nanostructures without residual layer using detachment-based nanolithography. Spin coated organic thin film and patterned stamp such as ultraviolet (UV) curable mold were prepared. The mold and organic thin film were contacted by slight pressure (1~2 bar). While conformal contact between mold and organic thin film, the sample was heated under the glass transient temperature. After cooling to room temperature, the mold was removed from substrate, rendering a pattern organic layer without residual layer. This method can form as small as 70 nm lines.

Paper Details

Date Published: 24 March 2006
PDF: 10 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61512O (24 March 2006); doi: 10.1117/12.682144
Show Author Affiliations
Jae Kwan Kim, Seoul National Univ. (South Korea)
Jee Won Park, Seoul National Univ. (South Korea)
Hongjoo Yang, Seoul National Univ. (South Korea)
Mansoo Choi, Seoul National Univ. (South Korea)
Joon Ho Choi, Seoul National Univ. (South Korea)
Kahp Yang Suh, Seoul National Univ. (South Korea)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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