Share Email Print

Proceedings Paper

Hot spot-based judgment methodology for high-end photomask availability for any exposure tools
Author(s): Satoshi Usui; Shigeru Hasebe; Shigeki Nojima; Kohji Hashimoto
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Small process window in ultra-low k1 lithography (k1<0.35) poses difficulties for judgment of the availability of high-end photomasks for preliminary exposure tools for high volume production ramp-up. Also, our previous judgment flow of high-end photomasks availability has several concerns. Therefore, the ultra-low k1 lithography requires accurate judgment methodologies for high-end photomask availability with short turn-around-time (TAT). In this paper, we propose a new concept concerning hot spot-based judgment flow which consists of two stages for high-end photomask availability. Our proposed flow permits judgment of high-end photomask availability for high volume production ramp-up with short TAT.

Paper Details

Date Published: 20 May 2006
PDF: 9 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832J (20 May 2006); doi: 10.1117/12.681793
Show Author Affiliations
Satoshi Usui, Toshiba Corp. (Japan)
Shigeru Hasebe, Toshiba Corp. (Japan)
Shigeki Nojima, Toshiba Corp. (Japan)
Kohji Hashimoto, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?