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Proceedings Paper

Experimental characterization of constituent errors in electron-beam lithography
Author(s): Russell Cinque; Peter Buck; Kyungsoo S. Yeo; Tadashi Komagata; Yasutoshi Nakagawa
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Paper Abstract

The composite critical dimension (CD) and registration performance of a photomask is limited partly by systematic constituent mask lithography tool errors. Test masks can be designed specifically to isolate these error sources so they can be measured and characterized independently from other error sources. This methodology allows the creation of a composite CD and registration error budget that can be used to realistically specify mask lithography tool requirements and predict actual performance on masks from these tools. In this study, we investigate the local CD and Registration errors that occur within a single deflection field on the JEOL JBX-9000MV vector shaped beam (VSB) electron-beam mask lithography system. Test patterns were designed to hold proximity, fogging, and loading effects constant and thereby show the true constituent error of the system. One advantage of using the JBX-9000MV in this study is that the step-and-repeat stage motion makes the position of each feature within the deflection field unambiguous compared to other VSB tools that use continuous stage motion. It is therefore relatively straightforward to characterize and compensate deflection errors. The authors will present experimental characterization of the constituent errors observed within a single deflection field. In addition, we will show how these errors can be controlled through increased shot settling time, increased deflection calibration, and multi-pass writing.

Paper Details

Date Published: 20 May 2006
PDF: 8 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831M (20 May 2006); doi: 10.1117/12.681748
Show Author Affiliations
Russell Cinque, Toppan Photomasks, Inc. (United States)
Peter Buck, Toppan Photomasks, Inc. (United States)
Kyungsoo S. Yeo, Toppan Photomasks, Inc. (United States)
Tadashi Komagata, JEOL USA, Inc. (United States)
Yasutoshi Nakagawa, JEOL Ltd. (Japan)

Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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