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Proceedings Paper

Ion emission from fused silica under 157-nm excimer laser irradiation at fluences below plasma formation threshold: the role of surface defects
Author(s): S. R. John; S. C. Langford; J. T. Dickinson
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Paper Abstract

At fluences well below the threshold for plasma formation, we have characterized the direct desorption of atomic ions from fused silica surfaces during 157-nm irradiation by time-resolved mass spectroscopy. The principal ions are Si+ and O+. The emission intensities are dramatically increased by treatments that increase the density of surface defects. Molecular dynamics simulations of the silica surface suggest that silicon ions bound at surface oxygen vacancies (analogous to E' centers) provide suitable configurations for the emission of Si+. We propose that emission is best understood in terms of a hybrid mechanism involving both antibonding chemical forces (Menzel-Gomer-Redhead model) and repulsive electrostatic forces on the adsorbed ion after laser excitation of the underlying defect.

Paper Details

Date Published: 7 June 2006
PDF: 11 pages
Proc. SPIE 6261, High-Power Laser Ablation VI, 626108 (7 June 2006); doi: 10.1117/12.674716
Show Author Affiliations
S. R. John, Washington State Univ. (United States)
S. C. Langford, Washington State Univ. (United States)
J. T. Dickinson, Washington State Univ. (United States)

Published in SPIE Proceedings Vol. 6261:
High-Power Laser Ablation VI
Claude R. Phipps, Editor(s)

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