
Proceedings Paper
Investigation of photoelectron properties in cubic AgCl emulsion with uniformly doped formate ionsFormat | Member Price | Non-Member Price |
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Paper Abstract
In this experiment the microwave absorption and phase-sensitive detection technique was used to detect the time-resolved signal of photoelectrons generated by 35-ps laser pulses in AgCl emulsions uniformly doped with different concentrations of formate ions (HCO2-). According to photoelectron decay signal, the photoelectron decay properties and the trap-capture properties, influencing the efficiency of latent image formation of the cubic AgCl grains, were discussed. The results indicate that when its concentration is 10-5mol/molAg, the formate ions act as hole traps obviously, enhancing the escape of electrons from pair recombination, but when its concentration is more than or less than 10-5mol/molAg, the formate ions may not act as hole traps effectively. We find that the optimal concentration of uniformly doped formate ions which can increase the photoelectron lifetime effectively is 10-5mol/molAg.
Paper Details
Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491W (9 June 2006); doi: 10.1117/12.674258
Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491W (9 June 2006); doi: 10.1117/12.674258
Show Author Affiliations
Guang-Sheng Fu, Hebei Univ. (China)
Xian Zhou, Hebei Univ. (China)
Shao-Peng Yang, Hebei Univ. (China)
Xian Zhou, Hebei Univ. (China)
Shao-Peng Yang, Hebei Univ. (China)
Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)
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