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Proceedings Paper

Catadioptric lens design: the breakthrough to hyper-NA optics
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Paper Abstract

To enable optical lithography for sub 55 nm features, ArF immersion lithography requires numerical apertures to be significantly larger than 1 - thus leading to new challenges for optical design. Refractive lens designs are not capable to capture these extreme etendues. Catadioptric lens designs can overcome these fundamental issues by keeping the diameters of the optical materials acceptable. We have studied various catadioptric design approaches. The main criteria used to evaluate the potential of the different solutions include mechanical complexity, reticle compatibility, optical sensitivities, polarization capabilities, image field shape, as well as enabling extendibility to even higher NAs. Our assessment leads us to a new design type called catadioptric in-line design which shows superior performance for high NA systems with NA > 1.1.

Paper Details

Date Published: 15 March 2006
PDF: 10 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615420 (15 March 2006); doi: 10.1117/12.668024
Show Author Affiliations
Bernhard Kneer, Carl Zeiss SMT AG (Germany)
Paul Gräupner, Carl Zeiss SMT AG (Germany)
Reiner Garreis, Carl Zeiss SMT AG (Germany)
Ralph Kläsges, Carl Zeiss SMT AG (Germany)
Heiko Feldmann, Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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