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Proceedings Paper

Plasma properties of a new-type surface wave-sustained plasma source under the conditions of depositing DLC films
Author(s): Junqi Xu; Hiroyuki Kousaka; Noritsugu Umehara; Dongfeng Diao
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Paper Abstract

Surface wave-sustained plasma (SWP) is one of the low-pressure, high- density plasma. Applying this technique, diamond-like carbon (DLC) films with excellent characteristics can be prepared by physical vapor deposition (PVD) method. However, the films' application is restricted in some degree, because it is difficult to control the film properties. In this paper, SWP was excited along a conductive rod at a frequency of 2.45 GHz without magnetic fields around the chamber wall. The fundamental theories of plasma diagnostic were presented and plasma properties were studied with a Langmuir probe under the conditions of depositing DLC films by PVD method with a graphite target. Plasma density, electron temperature, plasma potential and target current were measured at difference technique parameters such as gas pressure, microwave power, and so on. As a result, it was proved that plasma properties are greatly affected by microwave power, target voltage and argon gas pressure in chamber. The gas mass flow rate had almost no effect on plasma characters. At the same time, the results indicated that electron density is up to 1011-1012cm-3 even at the low pressure of 1 Pa.

Paper Details

Date Published: 23 January 2006
PDF: 8 pages
Proc. SPIE 6029, ICO20: Materials and Nanostructures, 60290L (23 January 2006);
Show Author Affiliations
Junqi Xu, Xi'an Institute of Technology (China)
Hiroyuki Kousaka, Nagoya Univ. (Japan)
Noritsugu Umehara, Nagoya Univ. (Japan)
Dongfeng Diao, Xi’an JiaoTong Univ. (China)

Published in SPIE Proceedings Vol. 6029:
ICO20: Materials and Nanostructures
Wei Lu; Jeff Young, Editor(s)

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