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Proceedings Paper

Integrating photonic and microfluidic structures on a device fabricated using proton beam writing
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Paper Abstract

Proton beam writing is a lithographic technique that can be used to fabricate microstructures in a variety of materials including PMMA, SU-8 and FoturanTM. The technique utilizes a highly focused mega-electron volt beam of protons to direct write latent images into a material which are subsequently developed to form structures. Furthermore, the energetic protons can also be used to modify the refractive index of the material at a precise depth by using the end of range damage. In this paper we apply the proton beam writing technique to the fabrication of a lab-on-a-chip device that integrates buried waveguides with microfluidic channels. We have chosen to use FoturanTM photostructurable glass for the device because both direct patterning and refractive index modification is possible with MeV protons.

Paper Details

Date Published: 21 April 2006
PDF: 8 pages
Proc. SPIE 6186, MEMS, MOEMS, and Micromachining II, 61860F (21 April 2006); doi: 10.1117/12.662495
Show Author Affiliations
A. A. Bettiol, National Univ. of Singapore (Singapore)
E. J. Teo, National Univ. of Singapore (Singapore)
C. N. B. Udalagama, National Univ. of Singapore (Singapore)
S. Venugopal Rao, Indian Institute of Technology Guwahati (India)
J. A. van Kan, National Univ. of Singapore (Singapore)
P. G. Shao, National Univ. of Singapore (Singapore)
F. Watt, National Univ. of Singapore (Singapore)

Published in SPIE Proceedings Vol. 6186:
MEMS, MOEMS, and Micromachining II
Hakan Ürey; Ayman El-Fatatry, Editor(s)

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