Share Email Print

Proceedings Paper

Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

ArF immersion lithography has opened the road towards increased optical resolution at the 193nm wavelength. Consequently, keeping the same 4X optical demagnification factor, the dimensions on the mask scale down to sub-wavelength values when we enter the 45nm node. At such dimensions, mask topography, mask type and materials as well as the polarization state of the light will influence the diffraction spectrum of a layout. As a result the image from high NA lithographic systems depends on the polarization state and intensities of the interfering orders. In general, with smaller features on the mask stronger polarization changes occur. Apart from the polarization changes in diffraction orders the total intensity in a diffraction order is also different from that predicted by standard scalar-Kirchhoff diffraction approximation used in present OPC packages. The difference in intensities of diffraction orders due to different mask materials and topography is the more dominating factor leading to through pitch CD errors when the scalar-Kirchhoff model is used for layout adjustment. Based on findings and classification of topography induced effects, a deviation-driver from scalar diffraction model was identified. This paper discusses a solution to compensate for topography effects while using the scalar diffraction model for reticle treatment. The area of applicability of such a scalar model, its advantages and limitations are illustrated with simulations and experiments.

Paper Details

Date Published: 15 March 2006
PDF: 10 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61541H (15 March 2006); doi: 10.1117/12.659345
Show Author Affiliations
Yuri Aksenov, Philips Research Europe (Belgium)
Peter Zandbergen, Philips Research Europe (Belgium)
Masaki Yoshizawa, Sony Corp. (Belgium)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?