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Proceedings Paper

Active spectral control of DUV light sources for OPE minimization
Author(s): Wayne J. Dunstan; Robert Jacques; Robert J. Rafac; Rajasekhar Rao; Fedor Trintchouk
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Paper Abstract

The variation of CD with pitch, or Optical Proximity Effect (OPE), in an imaging system shows a behavior that is characteristic of the imaging and process conditions and is sensitive to variations in those conditions. Maintaining stable process conditions can improve the effectiveness of mask Optical Proximity Correction (OPC). One of the factors which affects the OPE is the spectral bandwidth of the light source. To date, passive bandwidth stabilization techniques have been effective in meeting OPE control requirements. However, future tighter OPE specifications will require advanced bandwidth control techniques. This paper describes developments in active stabilization of bandwidth in Cymer XLA and 7010 lasers. State of the art on board metrology, used to accurately measure E95 bandwidth, has enabled a new array of active control solutions to be deployed. Advanced spectral engineering techniques, including sophisticated control algorithms, are used to stabilize and regulate the bandwidth of the light source while maintaining other key performance specifications.

Paper Details

Date Published: 15 March 2006
PDF: 9 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61542J (15 March 2006); doi: 10.1117/12.659283
Show Author Affiliations
Wayne J. Dunstan, Cymer Inc. (United States)
Robert Jacques, Cymer Inc. (United States)
Robert J. Rafac, Cymer Inc. (United States)
Rajasekhar Rao, Cymer Inc. (United States)
Fedor Trintchouk, Cymer Inc. (United States)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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