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Proceedings Paper

Cleaning of low thermal expansion material substrates for mask blanks in EUV lithography
Author(s): Sean Eichenlaub; Sebastian Dietze; Yoshiaki Ikuta; Helmut Popp; Kurt Goncher; Pat Marmillion; Abbas Rastegar
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Paper Abstract

Low thermal expansion material (LTEM) substrates were cleaned with recipes developed to clean blank quartz substrates. These recipes were capable of cleaning the LTEM without damaging the LTEM substrate. No effect of etching doped metals in LTEM was observed in these experiments. However, LTEM substrates currently require multiple cleaning cycles to obtain the same removal or cleaning efficiencies as quartz substrates. In addition, no change in the surface roughness or degradation of the backside choromium layer was observed.

Paper Details

Date Published: 9 November 2005
PDF: 5 pages
Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59923K (9 November 2005); doi: 10.1117/12.658508
Show Author Affiliations
Sean Eichenlaub, SEMATECH, Inc. (United States)
Sebastian Dietze, SEMATECH, Inc. (United States)
Yoshiaki Ikuta, SEMATECH, Inc. (United States)
Helmut Popp, SEMATECH, Inc. (United States)
Kurt Goncher, SEMATECH, Inc. (United States)
Pat Marmillion, SEMATECH, Inc. (United States)
Abbas Rastegar, SEMATECH, Inc. (United States)

Published in SPIE Proceedings Vol. 5992:
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed; Patrick M. Martin, Editor(s)

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