Share Email Print

Proceedings Paper

In-line semi-electrical process diagnosis methodology for integrated process window optimization of 65nm and below technology nodes
Author(s): Ming-Ta Lei; Kok-Hiang Tang; Yung-Chih Wang; Chia-Hsing Huang; Chih-Cherng Jeng; Lu-Kai Wang; Wei Fang; Yan Zhao; Jack Jau; Chin C. Hsia; M. S. Liang
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

This paper presents the application of an innovative concept as potentially very powerful in-line diagnosis techniques in both process window optimization and yield enhancement for 65nm-and-below generations of technology. These applications were fulfilled with a novel methodology of the measurement and quantification of the grey levels on the SEM images and their correlation with the physical/electrical parameters of the semiconductor process steps. With these techniques and the few demonstrations, the virtual in-line semi-electrical measurement is proven to be a feasible technique in achieving technology development with lower cost and faster iteration cycle for continuous improvement. Else than technology development, the same techniques can also be served for the purposes of process window optimization and tool/ recipe/ process monitoring/qualification applications in volume production.

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61521T (24 March 2006); doi: 10.1117/12.657803
Show Author Affiliations
Ming-Ta Lei, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Kok-Hiang Tang, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Yung-Chih Wang, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Chia-Hsing Huang, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Chih-Cherng Jeng, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Lu-Kai Wang, Hermes Microvision Inc. (United States)
Wei Fang, Hermes Microvision Inc. (United States)
Yan Zhao, Hermes Microvision Inc. (United States)
Jack Jau, Hermes Microvision Inc. (United States)
Chin C. Hsia, Taiwan Semiconductor Manufacturing Co. (Taiwan)
M. S. Liang, Taiwan Semiconductor Manufacturing Co. (Taiwan)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?