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Proceedings Paper

Intelligent model-based OPC
Author(s): W.C. Huang; C.M. Lai; B. Luo; C.K. Tsai; M.H. Chih; C.W. Lai; C.C. Kuo; R.G. Liu; H.T. Lin
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Paper Abstract

Optical proximity correction is the technique of pre-distorting mask layouts so that the printed patterns are as close to the desired shapes as possible. For model-based optical proximity correction, a lithographic model to predict the edge position (contour) of patterns on the wafer after lithographic processing is needed. Generally, segmentation of edges is performed prior to the correction. Pattern edges are dissected into several small segments with corresponding target points. During the correction, the edges are moved back and forth from the initial drawn position, assisted by the lithographic model, to finally settle on the proper positions. When the correction converges, the intensity predicted by the model in every target points hits the model-specific threshold value. Several iterations are required to achieve the convergence and the computation time increases with the increase of the required iterations. An artificial neural network is an information-processing paradigm inspired by biological nervous systems, such as how the brain processes information. It is composed of a large number of highly interconnected processing elements (neurons) working in unison to solve specific problems. A neural network can be a powerful data-modeling tool that is able to capture and represent complex input/output relationships. The network can accurately predict the behavior of a system via the learning procedure. A radial basis function network, a variant of artificial neural network, is an efficient function approximator. In this paper, a radial basis function network was used to build a mapping from the segment characteristics to the edge shift from the drawn position. This network can provide a good initial guess for each segment that OPC has carried out. The good initial guess reduces the required iterations. Consequently, cycle time can be shortened effectively. The optimization of the radial basis function network for this system was practiced by genetic algorithm, which is an artificially intelligent optimization method with a high probability to obtain global optimization. From preliminary results, the required iterations were reduced from 5 to 2 for a simple dumbbell-shape layout.

Paper Details

Date Published: 20 March 2006
PDF: 9 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615436 (20 March 2006); doi: 10.1117/12.657792
Show Author Affiliations
W.C. Huang, Taiwan Semiconductor Manufacturing Co. (Taiwan)
C.M. Lai, Taiwan Semiconductor Manufacturing Co. (Taiwan)
B. Luo, Taiwan Semiconductor Manufacturing Co. (Taiwan)
C.K. Tsai, Taiwan Semiconductor Manufacturing Co. (Taiwan)
M.H. Chih, Taiwan Semiconductor Manufacturing Co. (Taiwan)
C.W. Lai, Taiwan Semiconductor Manufacturing Co. (Taiwan)
C.C. Kuo, Taiwan Semiconductor Manufacturing Co. (Taiwan)
R.G. Liu, Taiwan Semiconductor Manufacturing Co. (Taiwan)
H.T. Lin, Taiwan Semiconductor Manufacturing Co. (Taiwan)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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