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Proceedings Paper

Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system
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Paper Abstract

A second phase in the immersion era is starting with the introduction of ultra high NA (NA >1) systems. These systems are targeting for 45 nm node device production and beyond. ASML TWINSCAN XT:1700i features a maximum NA of 1.2 and a 26x33 mm2 scanner field size. The projection lens is an in-line catadioptric lens design and the AERIAL XP illumination system enables conventional an off-axis illumination pupil shapes in either polarized or un-polarized modes at maximum light efficiency. In this paper a description and a performance overview of the TWINSCAN XT:1700i is given. We will present and discuss lithographic performance results, with special attention at low-k1 imaging using high NA and polarized illumination. Overlay, focus and productivity performance will also be presented.

Paper Details

Date Published: 15 March 2006
PDF: 14 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61541W (15 March 2006); doi: 10.1117/12.657558
Show Author Affiliations
Hans Jasper, ASML Netherlands B.V. (Netherlands)
Theo Modderman, ASML Netherlands B.V. (Netherlands)
Mark van de Kerkhof, ASML Netherlands B.V. (Netherlands)
Christian Wagner, ASML Netherlands B.V. (Netherlands)
Jan Mulkens, ASML Netherlands B.V. (Netherlands)
Wim de Boeij, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Bernhard Kneer, Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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