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Proceedings Paper

RIM-13: A high-resolution imaging tool for aerial image monitoring of patterned and blank EUV reticles
Author(s): M. Booth; A. Brunton; J. Cashmore; P. Elbourn; G. Elliner; M. Gower; J. Greuters; J. Hirsch; L. Kling; N. McEntee; P. Richards; V. Truffert; I. Wallhead; M. Whitfield
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Paper Abstract

Key features of the RIM-13 EUV actinic reticle imaging microscope are summarised. This is a tool which generates aerial images from blank or patterned EUV masks, emulating the illumination and projection optics of an exposure tool. Such images of mask defects, acquired by a CCD camera, are analysed using the tool software to predict their effect on resist exposure. Optical, mechanical and software performance of the tool are reported.

Paper Details

Date Published: 22 March 2006
PDF: 12 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510B (22 March 2006); doi: 10.1117/12.657556
Show Author Affiliations
M. Booth, Exitech Ltd. (United Kingdom)
A. Brunton, Exitech Ltd. (United Kingdom)
J. Cashmore, Exitech Ltd. (United Kingdom)
P. Elbourn, Exitech Ltd. (United Kingdom)
G. Elliner, Exitech Ltd. (United Kingdom)
M. Gower, Exitech Ltd. (United Kingdom)
J. Greuters, Exitech Ltd. (United Kingdom)
J. Hirsch, Exitech Ltd. (United Kingdom)
L. Kling, Exitech Ltd. (United Kingdom)
N. McEntee, Exitech Ltd. (United Kingdom)
P. Richards, Exitech Ltd. (United Kingdom)
V. Truffert, Exitech Ltd. (United Kingdom)
I. Wallhead, Exitech Ltd. (United Kingdom)
M. Whitfield, Exitech Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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