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Proceedings Paper

Spectroscopic polarized scatterometry applied to single-line profiling
Author(s): Jean-Louis Stehlé; Jean-Philippe Piel; Jose Campillo; Dorian Zahorski; Hugues Giovannini
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Paper Abstract

Scatterometry is one of the few metrology candidates that has true potential to analyse submicrometer critical dimension (CD). This physical constraint restricts initially the scalar theory of diffraction (Kirchhoff, Fraunhofer), where no computation is needed, to describe pattern with such characteristics. Now many techniques based in a rigourous analysis of diffraction (were polarisation is considered) are developped (RCWA), however these vector theory would be difficult to apply in real time due to time consuming by computation. For that reason, we push here scattering measurement of isolated lines, in the limit of the scalar theory. We use the scattering mode of SOPRA's GESP 5 instrument, which measure separately TE and TM polarisations.

Paper Details

Date Published: 24 March 2006
PDF: 7 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61522Z (24 March 2006); doi: 10.1117/12.657431
Show Author Affiliations
Jean-Louis Stehlé, SOPRA (France)
Jean-Philippe Piel, SOPRA (France)
Jose Campillo, SOPRA (France)
Dorian Zahorski, SOPRA (France)
Hugues Giovannini, Institut Fresnel-CNRS, Ecole Généraliste d'Ingénieurs de Marseille (France)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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