
Proceedings Paper
Dense spatial multiplexing enables high brightness multi-kW diode laser systemsFormat | Member Price | Non-Member Price |
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Paper Abstract
The materials processing industry has recently mandated the need for more efficient laser systems with higher beam quality and longer life. Current multiplexing techniques, state-of-the-art laser diodes and novel cooling designs are now emerging as possibilities to meet the ever demanding industry needs. This paper describes the design and initial results of a direct diode system that is aimed at delivering 1.5 kW of output power and a beam divergence of 40 mm mrad on a long life macro-channel cooler. The design entails multiplexing 2 wavelength combined beams and 2 polarization combined beams. Each of the four branches of the direct diode system utilizes a novel stacking and cooling design. The results from one of these branches, 1 wavelength and 1 polarization, are presented where the light is coupled into a fiber with a 400 μm core diameter and a NA of 0.22. Each branch consists of 60 diode laser mini-arrays, where each mini-array consists of four 100 μm wide emitters and a lateral fill factor of 50%. An output power of 500W at 10°C water temperature and 420 W at 25°C are demonstrated through the 400 μm fiber.
Paper Details
Date Published: 15 February 2006
PDF: 8 pages
Proc. SPIE 6104, High-Power Diode Laser Technology and Applications IV, 61040M (15 February 2006); doi: 10.1117/12.657267
Published in SPIE Proceedings Vol. 6104:
High-Power Diode Laser Technology and Applications IV
Mark S. Zediker, Editor(s)
PDF: 8 pages
Proc. SPIE 6104, High-Power Diode Laser Technology and Applications IV, 61040M (15 February 2006); doi: 10.1117/12.657267
Show Author Affiliations
Holger Schlüter, TRUMPF Photonics (United States)
Christoph Tillkorn, TRUMPF Laser (Germany)
Ulrich Bonna, TRUMPF Photonics (United States)
Greg Charache, TRUMPF Photonics (United States)
John Hostetler, TRUMPF Photonics (United States)
Christoph Tillkorn, TRUMPF Laser (Germany)
Ulrich Bonna, TRUMPF Photonics (United States)
Greg Charache, TRUMPF Photonics (United States)
John Hostetler, TRUMPF Photonics (United States)
Ting Li, TRUMPF Photonics (United States)
Carl Miester, TRUMPF Photonics (United States)
Robert Roff, TRUMPF Photonics (United States)
Thilo Vethake, TRUMPF Photonics (United States)
Claus Schnitzler, Ingeneric GmbH (Germany)
Carl Miester, TRUMPF Photonics (United States)
Robert Roff, TRUMPF Photonics (United States)
Thilo Vethake, TRUMPF Photonics (United States)
Claus Schnitzler, Ingeneric GmbH (Germany)
Published in SPIE Proceedings Vol. 6104:
High-Power Diode Laser Technology and Applications IV
Mark S. Zediker, Editor(s)
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