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Proceedings Paper

Design and use of multivariate approach error analysis APC system
Author(s): Jean de Caunes; Joost van Herk; Scott Warrick; Bertrand Le Gratiet; Marc Mikolajczak; Jean-Damien Chapon; Cedric Monget; Jan-Willem Gemmink
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Paper Abstract

On-going complex integration schemes and developments in processes present significant challenges to lithography in manufacturing advanced semiconductor integrated circuits. Although APC solutions are in place to assist in achieving robust CD control and overlay, there is a great need to increase the 'knowledge' of the system with respect to other contributors impacting the process. The problem becomes more complex in case of an ASIC Prototyping Fab where there is no big runner concept. This leads to the need of a product effect management requirement (Product layout and reticles impact). For this reason, we developed the multivariate R2R controller. This paper discusses the multi-variant methodology and results of a new R2R regulation algorithm in a 65nm node process. Specifically, parameters such as linear combinations of terms, alignment variation for overlay modeled parameters (inter-field / intra-field), CD impacts (reticles, process, tool, STI stack etc) are studied. New solutions for future technology nodes are presented in this paper. It includes for each contributor a multivariate method to assess vector responses and noise contribution. This is being applied on CD and Overlay measurement feedback. For each source of variation (or "Contributor"), the multivariate controller provides the estimated level of compensation requested to meet the target and the level of noise induced on lot processing. At the moment the multivariate R2R controller runs in production. A real evaluation of the existing sources of variations and noise is possible and demonstrated. The result is a significant regulation performance improvement.

Paper Details

Date Published: 14 March 2006
PDF: 10 pages
Proc. SPIE 6155, Data Analysis and Modeling for Process Control III, 615507 (14 March 2006); doi: 10.1117/12.657177
Show Author Affiliations
Jean de Caunes, Philips Semiconductors (France)
Joost van Herk, Philips Semiconductors (France)
Scott Warrick, Freescale Semiconductor (France)
Bertrand Le Gratiet, Philips Semiconductors (France)
Marc Mikolajczak, ST Microelectronics (France)
Jean-Damien Chapon, ST Microelectronics (France)
Cedric Monget, ST Microelectronics (France)
Jan-Willem Gemmink, Philips Semiconductors (France)

Published in SPIE Proceedings Vol. 6155:
Data Analysis and Modeling for Process Control III
Iraj Emami; Kenneth W. Tobin Jr., Editor(s)

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