Proceedings Paper
Study of ruthenium-capped multilayer mirror for EUV irradiation durability| Format | Member Price | Non-Member Price |
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Paper Abstract
The changes of chemical state and multilayer structure of Ru capped multilayer mirrors (MLMs) by irradiation of extreme ultraviolet (EUV) from synchrotron radiation (SR) were investigated using Auger electron spectroscopy (AES). It was found that irradiation induced Si diffusion and Si oxidation. Calculation of temperature distribution showed that Si diffusion was less relevant to temperature during irradiation.
Paper Details
Date Published: 24 March 2006
PDF: 4 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615135 (24 March 2006); doi: 10.1117/12.657089
Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)
PDF: 4 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615135 (24 March 2006); doi: 10.1117/12.657089
Show Author Affiliations
Hiromitsu Takase, Extreme Ultraviolet Lithography System Development Association (Japan)
Shigeru Terashima, Extreme Ultraviolet Lithography System Development Association (Japan)
Yoshio Gomei, Extreme Ultraviolet Lithography System Development Association (Japan)
Masayuki Tanabe, Extreme Ultraviolet Lithography System Development Association (Japan)
Yutaka Watanabe, Extreme Ultraviolet Lithography System Development Association (Japan)
Shigeru Terashima, Extreme Ultraviolet Lithography System Development Association (Japan)
Yoshio Gomei, Extreme Ultraviolet Lithography System Development Association (Japan)
Masayuki Tanabe, Extreme Ultraviolet Lithography System Development Association (Japan)
Yutaka Watanabe, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Aoki, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Shuichi Matsunari, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)
Yukinobu Kakutani, Univ. of Hyogo (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Shuichi Matsunari, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)
Yukinobu Kakutani, Univ. of Hyogo (Japan)
Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)
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