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Proceedings Paper

Micro-stereo-lithography system
Author(s): T. Yoshimoto; I. Miyaki; H. Yaze; Y. Maruka; N. Ri; T. Teramoto; K. Morohoshi; Y. Koyagi
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Paper Abstract

We have realized Micro-stereo-lithography technology and system. It can make micro 3D structures more reasonable throughput than existing systems. It has less 2 micron resolutions in the XY directions and 5 micron resolution in the Z layer. We developed a high resolution optical-apparatus, some new photo-polymerizing polymers and a mechanism to coat the thin film of the polymer. Our system can offer various structures with over-hung, hollowed and spiral shape with reasonable resolution and quick turnaround time by maskless technology. We show these results, for example, micro turbine, micro coil and photonic crystal. We hope these technologies will be useful for various fields in the future, for example, nano-imprint, industrial parts and medical fields.

Paper Details

Date Published: 24 March 2006
PDF: 9 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513I (24 March 2006); doi: 10.1117/12.657082
Show Author Affiliations
T. Yoshimoto, Laser-Solutions Co., Ltd. (Japan)
I. Miyaki, Laser-Solutions Co., Ltd. (Japan)
H. Yaze, Laser-Solutions Co., Ltd. (Japan)
Y. Maruka, Laser-Solutions Co., Ltd. (Japan)
N. Ri, Laser-Solutions Co., Ltd. (Japan)
T. Teramoto, D-MEC Ltd. (Japan)
K. Morohoshi, D-MEC Ltd. (Japan)
Y. Koyagi, Dainippon Screen Mfg. Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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