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Proceedings Paper

Characterizing nanoimprint pattern cross-section and fidelity from x-ray reflectivity
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Paper Abstract

To address several of the challenges associated with nanoimprint lithography, new measurement techniques that can correlate the physical structure of an imprinted nanostructure with the materials used and the imprinting conditions are critical for optimizing imprint processes. Specular X-ray reflectivity (SXR) is a widely used technique to quantify the thickness, density, and roughness of the non-patterned films. Here we extend the applicability of SXR to imprinted nanostructures by characterizing the pattern height, the line-to-space ratio as a function of pattern height, the residual layer thickness, and the fidelity of pattern transfer.

Paper Details

Date Published: 23 March 2006
PDF: 7 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61510N (23 March 2006); doi: 10.1117/12.656826
Show Author Affiliations
Hae-Jeong Lee, National Institute of Standards and Technology (United States)
Christopher L. Soles, National Institute of Standards and Technology (United States)
Hyun Wook Ro, National Institute of Standards and Technology (United States)
D. R. Hines, Univ. of Maryland, College Park (United States)
Ronald L. Jones, National Institute of Standards and Technology (United States)
Eric K. Lin, National Institute of Standards and Technology (United States)
Alamgir Karim, National Institute of Standards and Technology (United States)
Wen-li Wu, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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