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Proceedings Paper

Investigation of a novel discharge EUV source for microlithography
Author(s): Bruno S. Bauer; Volodymyr Makhin; Stephan Fuelling; Irvin R. Lindemuth
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Paper Abstract

A plasma discharge could be an inexpensive and efficient EUV source for microlithography, if issues of brightness, lifetime, debris, repetition rate, and stability can be resolved. A novel discharge EUV source (international patent pending) is being investigated that may offer an economical solution to these issues. The novel EUV discharge seeks to efficiently assemble a hot, dense, uniform, axially stable plasma with magnetic pressure and inductive current drive, employing resonant theta-pinch-type compression of plasma confined in a magnetic mirror. This resonantly compressed mirror plasma (RCMP) source would be continuously driven by a radio frequency oscillator, to obtain an EUV conversion efficiency greater than that of sources in which the plasma is discarded after each radiation burst. An analytic calculation indicates the novel RCMP source could provide 115 W of 13.45 nm radiation in 3.3 mm2sr etendue to an intermediate focus. Numerical modeling of RCMP dynamics has been performed with MHRDR-EUVL, a magnetohydrodynamic (MHD) numerical simulation with atomic and radiation physics. The numerical simulation demonstrates the efficacy of resonant magneto-acoustic heating. An experiment is being developed to test the new concept.

Paper Details

Date Published: 24 March 2006
PDF: 12 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 61513N (24 March 2006); doi: 10.1117/12.656817
Show Author Affiliations
Bruno S. Bauer, Univ. of Nevada/Reno (United States)
Volodymyr Makhin, Univ. of Nevada/Reno (United States)
Stephan Fuelling, Univ. of Nevada/Reno (United States)
Irvin R. Lindemuth, Univ. of Nevada/Reno (United States)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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