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Proceedings Paper

nDSE-based overlay alignment: enabling technology for nanometrology and fabrication
Author(s): Jun Gao; Carl Picciotto; Wei Wu; Inkyu Park; William M. Tong
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Paper Abstract

Displacement sensing and estimation (DSE) is important preprocessing task for many image-based processing systems that extract information from multiple images. In last two years, we gained significant insight of the nature of DSE and developed theory and algorithm framework named nanoscale displacement sensing and estimation (nDSE). We also build procedures to apply nDSE to overlay alignment down to the nanoscale. We will introduce two basic theories: Phase Delay Detection (PDD) and Derivatives-based Maximum Likelihood Estimation (DML) and associated DSE algorithms, noticeably Near-Neighbor-Navigation (N-Cubed) algorithm. We presented our best nDSE experimental result of 1 nm (1σ) while tracking 5 nm stepping. To develop nDSE-based nanoscale alignment, we introduced our definition of displacement, alignment and pseudo-displacement. We presented both theoretical and practical procedures to use nDSE to achieve nano-alignment down to the 10s of nano-meters and beyond. Then we compared nDSE-based nano-alignment to other industry standard alignment method and attempt to show the substantial advantages of nDSE based alignment in terms of cost and simplicity of the system design.

Paper Details

Date Published: 24 March 2006
PDF: 13 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615223 (24 March 2006); doi: 10.1117/12.656610
Show Author Affiliations
Jun Gao, HP Labs. (United States)
Carl Picciotto, HP Labs. (United States)
Wei Wu, HP Labs. (United States)
Inkyu Park, HP Labs. (United States)
William M. Tong, HP Labs. (United States)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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