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Proceedings Paper

Virtual measurements and simulation of interference microscopes
Author(s): Friedel Koerfer; Sandra Scheermesser
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Paper Abstract

Interference microscopes are a widely used tool in many parts of production processes where exact information about surfaces is needed. Users appreciate the high accuracy and resolution but often ignore the possible errors which cannot be neglected in high precision metrology. Besides the measurement result, the uncertainty is the most important information necessary to evaluate the quality of a measurement. At the moment standardized calibration strategies for interference microscopes are missing. In order to receive comparable results, standardized information about the uncertainty is needed. Thus, models for the determination of the uncertainty of interference microscopes have to be developed. Therefore a simulation environment is being created, which is able to simulate all processes occurring inside interference microscopes. In particular, influences of real environments like laboratories or production processes are important. Furthermore user induced influences are considered. With the tool, based on a ray tracing procedure, systematic variations of the disturbing influences are possible and the consequences on the interferogram and the measurement result can be simulated and analyzed. Hence it is possible to manage the error influences of these complex systems as well as the generation of and an uncertainty budget. The findings help to set up process orientated calibration strategies for interference microscopes to improve the comparability und the traceability of measurements.

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520M (24 March 2006); doi: 10.1117/12.656330
Show Author Affiliations
Friedel Koerfer, Fraunhofer Institute for Production Technology (Germany)
Sandra Scheermesser, Fraunhofer Institute for Production Technology (Germany)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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