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Proceedings Paper

Positive and negative tone double patterning lithography for 50-nm flash memory
Author(s): Chang-Moon Lim; Seo-Min Kim; Young-Sun Hwang; Jae-Seung Choi; Keun-Do Ban; Sung-Yoon Cho; Jin-Ki Jung; Eung-Kil Kang; Hee-Youl Lim; Hyeong-Soo Kim; Seung-Chan Moon
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Paper Abstract

Double patterning lithography is very fascinating way of lithography which is capable of pushing down the k1 limit below 0.25. By using double patterning lithography, we can delineate the pattern beyond resolution capability. Target pattern is decomposed into patterns within resolution capability and decomposed patterns are combined together through twice lithography and twice etch processes. Two ways, negative and positive, of doing double patterning process are contrived and studied experimentally. In this paper, various issues in double patterning lithography such as pattern decomposition, resist process on patterned topography, process window of 1/4 pitch patterning, and overlay dependent CD variation are studied on positive and negative tone double patterning respectively. Among various issues about double patterning, only the overlay controllability and productivity seemed to be dominated as visible obstacles so far.

Paper Details

Date Published: 15 March 2006
PDF: 8 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615410 (15 March 2006); doi: 10.1117/12.656187
Show Author Affiliations
Chang-Moon Lim, Hynix Semiconductor Inc. (South Korea)
Seo-Min Kim, Hynix Semiconductor Inc. (South Korea)
Young-Sun Hwang, Hynix Semiconductor Inc. (South Korea)
Jae-Seung Choi, Hynix Semiconductor Inc. (South Korea)
Keun-Do Ban, Hynix Semiconductor Inc. (South Korea)
Sung-Yoon Cho, Hynix Semiconductor Inc. (South Korea)
Jin-Ki Jung, Hynix Semiconductor Inc. (South Korea)
Eung-Kil Kang, Hynix Semiconductor Inc. (South Korea)
Hee-Youl Lim, Hynix Semiconductor Inc. (South Korea)
Hyeong-Soo Kim, Hynix Semiconductor Inc. (South Korea)
Seung-Chan Moon, Hynix Semiconductor Inc. (South Korea)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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