A resolution of 45nm dense lines has been be realized in a 100nm thick commercial available positive tone chemically amplified resist (pCAR) using the Leica SB350 variable shaped beam writer. On the basis of this resist process and by optimization of photomask blank material as well as by adaptation of chrome and quartz etching processes, a nanoimprint template technology has been developed which enables patterning of 50nm dense lines. The sensitivity of the selected pCAR as well as the performance of the implemented dynamical stage control of the Leica pattern generator, facilitates an acceptable throughput even for complex pattern. We characterized the templates in terms of feature profile, CD linearity and pattern fidelity. The final imprinting of different pattern proved the applicability of the manufactured stamps for the nanoimprint technology.

Date Published: 23 March 2006
PDF: 12 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615115 (23 March 2006); doi: 10.1117/12.656108

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)