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Proceedings Paper

Novel high refractive index fluids for 193nm immersion lithography
Author(s): Julius Santillan; Akihiko Otoguro; Toshiro Itani; Kiyoshi Fujii; Akifumi Kagayama; Takashi Nakano; Norio Nakayama; Hiroaki Tamatani; Shin Fukuda
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Paper Abstract

Despite the early skepticism towards the use of 193-nm immersion lithography as the next step in satisfying Moore's law, it continuous to meet expectations on its feasibility in achieving 65-nm nodes and possibly beyond. And with implementation underway, interest in extending its capability for smaller pattern sizes such as the 32-nm node continues to grow. In this paper, we will discuss the optical, physical and lithographic properties of newly developed high index fluids of low absorption coefficient, 'Babylon' and 'Delphi'. As evaluated in a spectroscopic ellipsometer in the 193.39nm wavelength, the 'Babylon' and 'Delphi' high index fluids were evaluated to have a refractive index of 1.64 and 1.63 with an absorption coefficient of 0.05/cm and 0.08/cm, respectively. Lithographic evaluation results using a 193-nm 2-beam interferometric exposure tool show the imaging capability of both high index fluids to be 32-nm half pitch lines and spaces.

Paper Details

Date Published: 21 March 2006
PDF: 8 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61544Q (21 March 2006); doi: 10.1117/12.656089
Show Author Affiliations
Julius Santillan, Semiconductor Leading Edge Technologies, Inc. (Japan)
Akihiko Otoguro, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)
Kiyoshi Fujii, Semiconductor Leading Edge Technologies, Inc. (Japan)
Akifumi Kagayama, Mitsui Chemicals, Inc. (Japan)
Takashi Nakano, Mitsui Chemicals, Inc. (Japan)
Norio Nakayama, Mitsui Chemicals, Inc. (Japan)
Hiroaki Tamatani, Mitsui Chemicals, Inc. (Japan)
Shin Fukuda, Mitsui Chemicals, Inc. (Japan)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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