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Proceedings Paper

Table-top EUV reflectometer
Author(s): U. Hinze; B. Chichkov
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Paper Abstract

A novel compact EUV-reflectometer recently developed is presented. The designconcept relies on a flexible approach, thus this reflectometer can be set up as a compact table-top tool for a specified task as well as a full all-purpose reflectometer. As an EUV-source an electron-based microfocus EUV-tube is used. This EUV source is debris-free and provides a typical output of 30μW at 13.5 nm. The reflectometer benefits from the very good long-time stability and spatial stability of this tube. Reflectivity measurements from grazing incidence to nearly normal incidence as well as transmission studies can be realized in the same setup at a typical precision of measurements of 0.5%. A precise computer-controlled positioning unit allows to vary and scan all important parameters online, allowing for example complex surface scans and angle variations. The concept of the reflectometer is discussed and recent results are presented. This device can be purchased from the Laser Zentrum Hannover e.V.

Paper Details

Date Published: 24 March 2006
PDF: 4 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615136 (24 March 2006); doi: 10.1117/12.656060
Show Author Affiliations
U. Hinze, Laser Zentrum Hannover e.V. (Germany)
B. Chichkov, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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