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Proceedings Paper

Lens-cementing technology used in optical system of DUV wavelength region: selection of optical cement and degradation evaluation by DUV irradiation
Author(s): Takashi Takahashi; Susumu Saito; Toshiki Okumura; Etsuya Suzuki; Tatsuya Kojima; Shinsuke Motomiya; Hidesuke Maruyama; Hitoshi Suzuki; Koji Machida; Toru Tojo
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Paper Abstract

In this paper, a newly developed optical lens cementing technology is reported. Here, a fluoride material is used as an optical cement which can reduce damage from DUV radiation. The degradation of transmittance and the accuracy of surface of the cemented optical elements including adhesive used for cementing have been evaluated after prolonged DUV irradiation. It has been shown that with 248 nm wavelength this cement works quite well, and moreover, even with 193 nm wavelength, when used for 1000 hours, the change in transmittance was negligible where average irradiation power was kept within 300mW/cm2. Hence for all practical purpose the use of this cement in microscope objective is quite acceptable for 248 nm applications, thus confirming that this cementing technology is satisfactory and meets the performance requirement of DUV inspection systems.

Paper Details

Date Published: 24 March 2006
PDF: 9 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523P (24 March 2006); doi: 10.1117/12.654700
Show Author Affiliations
Takashi Takahashi, Topcon Corp. (Japan)
Susumu Saito, Topcon Corp. (Japan)
Toshiki Okumura, Topcon Corp. (Japan)
Etsuya Suzuki, Topcon Corp. (Japan)
Tatsuya Kojima, Topcon Corp. (Japan)
Shinsuke Motomiya, Topcon Corp. (Japan)
Hidesuke Maruyama, Topcon Corp. (Japan)
Hitoshi Suzuki, Topcon Corp. (Japan)
Koji Machida, Lasertec Corp. (Japan)
Toru Tojo, Topcon Corp. (Japan)

Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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