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Proceedings Paper

In situ crystal growth imaging during explosive crystallization
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Paper Abstract

Explosive crystallization of amorphous germanium of 0.89 and 1.80 microns in thickness deposited on quartz substrates was investigated. A scalloped, mixed, and columnar regime was observed. In situ images captured using dark field imaging reveal the shape of the explosive crystallization front. Crystallization was induced by a frequency tripled Nd:YAG laser (λ = 355 nm) focused to a tight line. A second Nd:YAG laser was frequency doubled (λ = 532 nm) and used as an illumination source for two time resolved pictures. The shape and speed of the explosive crystallization front is observed for various heat loss parameters and crystallization regimes and is generally in good agreement with the literature. Surface morphology is inspected by Atomic Force Microscopy (AFM) after explosive crystallization has completed.

Paper Details

Date Published: 1 March 2006
PDF: 8 pages
Proc. SPIE 6106, Photon Processing in Microelectronics and Photonics V, 610614 (1 March 2006); doi: 10.1117/12.647909
Show Author Affiliations
M. Rogers, Univ. of California, Berkeley (United States)
S. H. Ko, Univ. of California, Berkeley (United States)
C. Grigoropoulos, Univ. of California, Berkeley (United States)

Published in SPIE Proceedings Vol. 6106:
Photon Processing in Microelectronics and Photonics V
David B. Geohegan; Tatsuo Okada; Craig B. Arnold; Frank Träger; Jan J. Dubowski; Michel Meunier; Andrew S. Holmes, Editor(s)

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