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Proceedings Paper

Optical module fabrication using nanoimprint technology
Author(s): Markus Rossi; Hartmut Rudmann; Susanne Westenhöfer; Martin Salt; Rainer Pelzer
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Paper Abstract

UV-NanoImprint Lithography (NIL) is a fast and low cost method, which becomes an increasingly important instrument for fabrication of μ-TAS and telecommunication devices. The key elements of UV-NIL are transparent molds and low viscosity resists. Two different transparent mold materials, allowing UV curing through the stamp, were developed: rigid quartz or flexible PDMS. Typical resist viscosities are in a range of <100mPas, ensuring fast and successful filling of the stamp cavities. UV-curing is carried out at a wavelength of 350-450 nm.

Paper Details

Date Published: 23 January 2006
PDF: 3 pages
Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 61100L (23 January 2006); doi: 10.1117/12.646520
Show Author Affiliations
Markus Rossi, Heptagon Oy (Switzerland)
Hartmut Rudmann, Heptagon Oy (Switzerland)
Susanne Westenhöfer, Heptagon Oy (Switzerland)
Martin Salt, Heptagon Oy (Switzerland)
Rainer Pelzer, EV Group (Austria)

Published in SPIE Proceedings Vol. 6110:
Micromachining Technology for Micro-Optics and Nano-Optics IV
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

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